ICP CVD system for Graphene and Boron Carbide Layers

ICP CVD system for Graphene and Boron Carbide Layers


Negotiable Min Order Quantity Unit

Required Quantity
Place of Origin
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Production method
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Shipping / Lead Time
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Keyword
cvd
Category
Other Machinery & Industry Equipment

A-Tech System, Inc.

Country / Year Established
South Korea South Korea /
Business type
Others
Verified Certificate

12

DUNS

Product name ICP CVD system for Graphene and Boron Carbide Layers Certification -
Category Other Machinery & Industry Equipment Ingredients -
Keyword cvd Unit Size -
Brand name - Unit Weigh -
origin Stock -
Supply type - HS code -

Product Information

Graphene synthesis

Special Features

Multi-functional CVD system combined with ICP CVD and probe station.
Maximum substrate temperature: 1,000°C.
Automatic loading available during susceptor heating.
High density plasma source.
PC-control system.

Specifications

Wafer capacity : 6" wafer x 1
Average throughput: 4,800 wafer/year
Dimension : 1,500W × 1,800D × 1,830H (mm3)
Power : ICP Power supply
Bias power supply
Heater : Heating element - SiC coated graphite(max. temp.:1,200°C)
Gas : Ar/CH4/H2/B2H2/C2H2/O2/N2/NH3
Pump : dry pump, turbo pump, booster pump

B2B Trade

Price (FOB) Negotiable transportation -
MOQ Negotiable Leadtime Negotiable
Payment Options Negotiable Shipping time Negotiable

A-Tech System, Inc.

Country / Year Established
South Korea South Korea /
Business type
Others

12

DUNS

President
Cho, Young Sang
Address
175-25, Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, 403-853, Rep. Korea
Product Category
Machinery & Parts
Company introduction

Developed itmes

- Ion beam source
- Arc source
- Filtered cathodic vacuum arc system and process
- LPCVD for nanotube synthesis
- Silica PECVD system
- UHV(Ultra High Vacuum) sputtering system
- Silica TCP (Transformer Coupled Plasma) etcher
- UHV-sputter system for ferromagnetic multilayers
- Vacuum arc system for nitrides deposition
- In-line system of vacuum arc deposition for protecting PDP
  electrodes
- High vacuum test system for a flat light source evaluation
- Multifunctional standard sputtering system for R&D
- NPPN(New Post Plasma Nitriding) System
- Sputter for polygon mirror applicable to laser printer
- Production scale of arc ion plating (AIP) system
- Ion beam sputter for precision optics
- Production scale of AIP and NPPN systems
- Ion plating system for various coloration
- Pilot scale of arc discharge equipment for CNT transparent electrode
  sputter web coater for flexible display research
- Sputter system for ophthalmic
- Polycrystalline silicon ingot growing equipment
- PECVD system for anti-reflective coatings on solar cell
- PECVD system for graphene deposition
- Al plasma nitriding equipment for mass production with KAITECH
- Equipment of carbon nanotube using electrical arc discharge method
- Graphene PECVD-PVD Cluster equipment

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