Web Coater System
Negotiable Min Order Quantity Unit
- Required Quantity
-
- Place of Origin
- Payment Terms
- Negotiable
- Production method
- Negotiable
- Shipping / Lead Time
- Negotiable / Negotiable
- Keyword
- sputter, deposition
- Category
- Other Machinery & Industry Equipment
A-Tech System, Inc.
- Country / Year Established
-
South Korea
/
- Business type
- Others
- Verified Certificate
-
12
| Product name | Web Coater System | Certification | - |
|---|---|---|---|
| Category | Other Machinery & Industry Equipment | Ingredients | - |
| Keyword | sputter , deposition | Unit Size | - |
| Brand name | - | Unit Weigh | - |
| origin | Stock | - | |
| Supply type | - | HS code | - |
Product Information
Special Features
Roll to Roll System for mass production.
PC control based on PLC.
Metal deposition on flexible film
Flexible film thickness: 2um
Speedy deposition and throughput
Loading capacity : 5km per day
Average throughput 1,800km per year
Specifications
Dimension : 2,714L x 3,393H x 2,008W (mm3)
Chamber body : Ø800×800H
Power : Sputter : DC pulse 10kW
E-beam Evaporation : E-BEAM 15kW
Gas : Ar, N2
Pump : Rotary(3,200 l/min) & Booster(6,000 l/min) & Cryo pump(10,000 l/sec)
B2B Trade
| Price (FOB) | Negotiable | transportation | - |
|---|---|---|---|
| MOQ | Negotiable | Leadtime | Negotiable |
| Payment Options | Negotiable | Shipping time | Negotiable |
- President
- Cho, Young Sang
- Address
- 175-25, Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, 403-853, Rep. Korea
- Product Category
- Machinery & Parts
- Company introduction
-
Developed itmes
- Ion beam source
- Arc source
- Filtered cathodic vacuum arc system and process
- LPCVD for nanotube synthesis
- Silica PECVD system
- UHV(Ultra High Vacuum) sputtering system
- Silica TCP (Transformer Coupled Plasma) etcher
- UHV-sputter system for ferromagnetic multilayers
- Vacuum arc system for nitrides deposition
- In-line system of vacuum arc deposition for protecting PDP
electrodes
- High vacuum test system for a flat light source evaluation
- Multifunctional standard sputtering system for R&D
- NPPN(New Post Plasma Nitriding) System
- Sputter for polygon mirror applicable to laser printer
- Production scale of arc ion plating (AIP) system
- Ion beam sputter for precision optics
- Production scale of AIP and NPPN systems
- Ion plating system for various coloration
- Pilot scale of arc discharge equipment for CNT transparent electrode
sputter web coater for flexible display research
- Sputter system for ophthalmic
- Polycrystalline silicon ingot growing equipment
- PECVD system for anti-reflective coatings on solar cell
- PECVD system for graphene deposition
- Al plasma nitriding equipment for mass production with KAITECH
- Equipment of carbon nanotube using electrical arc discharge method
- Graphene PECVD-PVD Cluster equipment
- Main Product
