VTC-1100PO system is designed for precise coating on optics The key features of the system are High reliability Advanced system configuration and design Easy "One button" operation High precision and repeatability The utilizing of solid silica target

Pumping System

• includes Diffusion Pumps (1 sets) model VTC 24", Rotary Mechanical
• Pump model E2M 175 (Edwards), Booster Mechanical Pump model
• EH1200(Edwards) and VTC CRYO-6 water vapour Cryopump.

E-gun

• Electron Beam Gun- Two set with 270 degree angle
• One with 12-pocket crucible, 15 cc each.
• Second gun Throgh type Pocket for solid silica target

Ion Source VTC-5

• RF Ion Beam Source-1 set, 13.56MHz standard industrial frequency.
• Maximum RF power-600W, Maximum Ion Energy is 7.5kV, max. current-1A. Grid diameter is 100mm
• The Ion Beam Source is equiped with auto-matching system.

Gas Control System

• includes MFC-based system for oxygen and argon

Control System

• Optical Monitor System: Fully digital optical monitor, 40program of up to 50 layers each. The Process programming and Process data logging to PC via RS232 port
• The measuring method-quarter waves or fractional quarter wave calculation. measuring accuracy is with in 0.1% 0f amplitude
• Chip changer 35pcs. of monitor chip capacity, automatic chip changing, chip temperature sensor and chip heaters are included
• Monochromator 1/8, with capability of interchanging gratings
• The operational wavelength selection is menual or automatic.
• Detector-for visible or IR range.
• Visible range(Up to 900nm)-PMT detector and amplifier,
• IR(from 700 up to 2600nm)- PbS detector and pre-amplifier
• Deposition Controller are with Dual Quartz Measuring Head provides extensive program storage: 99 processes, 999 layer definitions, 32 complete material definitions.

Fully Automatic operation

• is provides by PC and VAC-TEC software.