Wet Bench Application：Developing ProcessEtching ProcessStripping ProcessCleaning ProcessMask CleanerSuitable Size：2"-8" WaferProduct Type：Wet BenchorWet station
Operation Mode：Auto / Semi-Auto / ManualSpecialty：Build-to-order availableAvailable Option：Class 100 or 1000CIM ConnectChemical Supply SystemCO2 / IRPLC / PC Base / PACDatalogicTemperature Measurement Data Acquisition SystemProduct Feature：Use quality pipe and valve componentUse PLC for electronic controllerRobotic horizontal and vertical stroke for high accuracy, stability and positioningQuarantine zone for both acidic gas and electrical substanceFlexible disposition scheme for QDRModularized pipeline installment allows swift and convenient maintenanceProduct design is highly adaptable to fit in customized environment according to the actual needsCSE’s batch wet process systems, wet stations and wet benches are designed for silicon etch, wafer cleaning, and wafer stripping for wafers from 100 mm up to 250 mm, and include fully automatic, semi-automatic and manual options, with a choice of linear and rotary robotics. We has a solution to meet most wet etching, wet process, parts cleaning and wafer cleaning needs.

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