Outline

Thermal CVD system of the VTS corporation is thin film deposition equipment using a reaction to adhere gas atoms onto a plate by ionizing the reactive gas with the thermal source energy.

General Specification

1. Chamber: Water cooled double wall chamber

2. Sample size: Max 50 x 500 mm

3. Base pressure: < 9E-4 Torr

4. RF plasma: RF power supply 600W

5. Heater: Hot wall resistance heater

6. Heating control: 3-zone heating control

7. Operating temp.: ~950degree C (Max. 1,000degree C)

8. Process gas: Ar, H2, CH4