Oxide Evaporation (deposition) Material


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Required Quantity
Place of Origin
Brand name
TYR
Payment Terms
Negotiable
Production method
Negotiable
Shipping / Lead Time
Negotiable / Negotiable
Keyword
evaporation, sputtering targets, thin film coating, deposition
Category
Industrial Supplies , Semiconductors , Other Paint & Coatings , Oxide

Huizhou Tian Yi Rare Material Co.,Ltd

Membership
BIZ
Country / Year Established
China China /
Business type
Others
Verified Certificate

10

Product name Oxide Evaporation (deposition) Material Certification -
Category Industrial Supplies
Semiconductors
Other Paint & Coatings
Oxide
Ingredients -
Keyword evaporation , sputtering targets , thin film coating , deposition Unit Size -
Brand name TYR Unit Weigh -
origin Stock -
Supply type - HS code -

Product Information

High Pure Oxide Evaporation (deposition) Material

 

Pure Metal Evaporation Material    Alloy Evaporation Material        Noble metal Evaporation Material    

Compound (Oxide, Fluoride, Sulfide, Selenide, Telluride, Mixture) Evaporation Material

 

Shape: shots, pellets, pieces, granules, rods, tablets

Spec.: 

Shots: 3mm diameter, 6mm diameter e.t.c

Pellets: 3mm dia. X 3mm L, 6mm dia. X 6mm L, 10mm dia. X 5mm L e.t.c

Pieces, Granules: 1-2.5mm, 3-6mm, 3-8mm, 1-3mm, 3-12mm e.t.c

Rods: 3mm diameter, 5mm diameter, 10mm diameter e.t.c   

 

 Material Name

Formula

 Purity

Form

Aluminum Oxide

Al2O3

99.99%

Ceramic, Crystal

Gadolinium Oxide

Gd2O3

Gd2O3/TREO>99.99%, TREO>99%

Ceramic

Hafnium Oxide

HfO2

99.99%

Ceramic

Silicon Oxide

SiO

99.9%

Ceramic, Crystal

Silicon Dioxide

SiO2

99.995%

Ceramic, Crystal

Titanium Dioxide

TiO2

99.99%

Ceramic

Titanium Oxide

Ti2O3

99.99%

Ceramic, Crystal

Yttrium Oxide

Yb2O3

Yb2O3/TREO>99.99%, 99.999%; TREO>99%

Ceramic

Lanthanum Titanium Oxide

LaTiO3

99.99%

Ceramic

Zinc Oxide

ZnO

99.99%

Ceramic

Zirconium Oxide

ZrO2

99.95%

Ceramic

Yttrium Oxide

Y2O3

Y2O3/TREO>99.99%, 99.999%; TREO>99%

Ceramic

Titanium Oxide

Ti4O7

99.99%

Ceramic

Tin Oxide

SnO

99.9%

Ceramic

Iron Oxide

Fe2O3

99.9%

Ceramic

Strontium Titanate

SrTiO3

99.9%

Ceramic

Cerium Oxide

CeO2

CeO2/TREO>99.99%, 99.999%; TREO>99%

Ceramic

Indium Tin Oxide

ITO

99.99%

Ceramic

Magnesium Oxide

MgO

99.9%

Ceramic, Crystal

Scandium Oxide

Sc2O3

Sc2O3/TREO>99.9%, 99.99%; TREO>99%

Ceramic

Titanium Oxide

TiO

99.99%

Ceramic

Trititanium pentoxide

Ti3O5

99.99%

Ceramic, Crystal

Tantalum Pentoxide

Ta2O5

99.99%

Ceramic

Zirconium Titanium Oxide

ZrO2-TiO2

99.9%

Ceramic

Praseodymium Titanate

PrTiO3

99.9%

Ceramic

Zirconium Magnesium Oxide

ZrO2-MgO

99.99%

Ceramic

Zirconium Tantalum Oxide

ZrO2-Ta2O5

99.99%

Ceramic

Niobium Pentoxide

Nb2O5

99.99%

Ceramic

Zirconium Oxide

ZrO

99.9%

Ceramic

Tin Oxide

SnO2

99.9%

Ceramic

Barium Titanate

BaTiO3

99.9%

Ceramic

B2B Trade

Price (FOB) Negotiable transportation -
MOQ Negotiable Leadtime Negotiable
Payment Options Negotiable Shipping time Negotiable

Huizhou Tian Yi Rare Material Co.,Ltd

Country / Year Established
China China /
Membership
BIZ
Business type
Others

10

President
Amy Chiu
Address
12 K of Shiji, Shijixingtian Bldg, YanDa Road, Huizhou, China
Product Category
Industrial Supplies,Other Minerals & Metallurgy Products,Semiconductors
No. of Total Employees
1-50
Company introduction
TYR has been established in 2004 year, specializes in a wide category of sputtering targets, evaporation source material, rare earth material and chemistry reagent, PVD materials base on metals, alloys, compounds. we offer targets bonding service, we serving government research establishments, universities and high technology industries. We using a variety of specialized processes including hot pressing, hot/cold isostatic pressing, and vacuum melting, vacuum sintering, we can provide the kind of homogenous, fine-grained, high-density materials that conform to the strictest quality control, we always aim to put quality first. Our product list include Metal sputtering targets, Alloy sputtering targets, Noble metal sputtering targets, Noble alloy sputtering targets, Oxide Ceramic Sputtering targets, Boride Ceramic Sputtering Targets, Carbide Ceramic Sputtering Targets, Fluoride Ceramic Sputtering Targets, Nitride Ceramic Sputtering Targets, Sulfide Ceramic Sputtering Targets, Selenide Ceramic Sputtering Targets, Silicide Ceramic Sputtering Targets, Telluride Ceramic Sputtering Targets, metal evaporation source, alloy evaporation source, optical thin film coating material, rare earth oxide and each high pure chemistry reagent. Sputtering Targets Materials list: High Pure Metal Sputtering Targets: Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper (Cu), Dysprosium (Dy), Erbium (Er), Eur (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, (C), Hafnium (Hf), Holmium (Ho), Iridium (Ir), Indium (In), Iron (Fe), Lanthanum (La), Lead (Pb), Lutetium (Lu), Manganese (Mn), Molybdenum (Mo), Magnesium (Mg), Neodymium (Nd), Niobium (Nb), Nickel (Ni), Palladium (Pd), Platinum (Pt), Praseodymium (Pr), Rhenium (Re), Ruthenium (Ru), Samarium (Sm), Scandium (Sc), Selenium (Se), Silicon (Si), Silver (Ag), Tantalum (Ta), Terbium (Tb), Tellurium (Te),Tin (Sn), Thulium (Tm), Titanium (Ti), Tungsten (W), Vanadium (V), Ytterbium (Yb), Yttrium (Y), Zirconium (Zr), Zinc (Zn) ; Alloy Sputtering Targets: Al alloy targets, Al-Cu, Al-Cr, Al-Nd, Al-Si, Al-Si-Cu, Al-Ag Cu alloy targets: Cu-Ag, Cu-Co, Cu-Ga, Cu-In, Cu-Ni Co alloy targets: Co-Cr, Co-Cr-Mo, Co-Fe, Co-Fe-B ,Co-Ni, Co-Ni-Cr, Co-Pt Ni alloy targets: Ni-Al, Ni-Cr, Ni-Cr-Si, Ni-Fe, Ni-Mn, Ni-Ti, Ni-V, Ti alloy targets: Ti-Al, Ti-Ni, Ti-Zr, Ti-Co Ta alloy targets: Ta-Al, Ta-W W alloy targets: W-Ti, W-Mo, W-B, W-Re Mo alloy targets: Mo-Nb, Mo-Si, Mo-Al Fe alloy targets: Fe-B, Fe-Co, Fe-Mn, Fe-Hf, Fe-Gd, Fe-Tb Zr alloy targets: ZrAl, ZrCu, ZrFe, ZrNb, ZrNi, ZrTi, ZrY, Noble alloy targets: Au-Ag, Ag-Cu, Ir-Mn, Ir-Re, Ir-Ru, Au-Sn, Ag-In, Ag-Sn e.t.c Ceramic sputtering target: Oxide Ceramic Sputtering targets: Al2O3, AZO, Sb2O3, ATO, BaTiO3, Bi2O3, CeO2, CuO, Cr2O3, Dy2O3, Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2, HfO2, Ho2O3, In2O3, In2O3-SnO2 (ITO), Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3, LiNbO3, Lu2O3, MgO, MoO3, Nd2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2, Tm2O3, TiO, TiO2, Ti3O5, Ti2O3, SnO2, SnO, WO3, WO3-Li, V2O5, VO2, Yb2O3, Y2O3, Y2O3-ZrO2 (YSZ), YBCO, ZnO, ZnO:Al, ZnO-In2O3, ZrO2, ZrO2-5-15wt%CaO) Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, FeB, HfB2 ,LaB6, Mo2B, Mo2B5 ,NbB, TaB2, TiB2, W2B5, WB, VB, YB6, ZrB2 Carbide Ceramic Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, W2C, VC, ZrC Fluoride Ceramic Sputtering Targets : AlF3, BaF2, CaF2, LiF, MgF2, NaF, Na3AlF6, YF3, YbF3 Nitride Ceramic Sputtering Targets :AlN, BN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN Sulfide Ceramic Sputtering Targets: CuS, Cu2S, CdS, FeS, FeS2, GeS, SnS, In2S3, MoS2, TaS2, WS2, ZnS Selenide Ceramic Sputtering Targets: Bi2Se3, CdSe, CuSe, Ga2Se3, In2Se3, PbSe, MoSe2, NbSe2, TaSe2, WSe2, ZnSe Silicide Ceramic Sputtering Targets: Cr3Si, CrSi2, CoSi2, HfSi2, MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2, ZrSi2 Telluride Ceramic Sputtering Targets: Bi2Te3, CdTe, CuTe, Ga2Te3, GeTe, PbTe, MoTe2, NbTe2, TaTe2, WTe2, ZnTe
Main Markets

Egypt Egypt

France, Metropolitan France, Metropolitan

Germany Germany

Hong Kong(China) Hong Kong(China)

India India

Japan Japan

South Korea South Korea

U. Kingdom U. Kingdom

U.S.A U.S.A

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