Oxide ceramic sputtering targets


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Brand name
TYR
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Keyword
chemical, sputtering targets, thin film coating, evaporation material
Category
Industrial Supplies , Other Machinery & Industry Equipment , Oxide

Huizhou Tian Yi Rare Material Co.,Ltd

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BIZ
Country / Year Established
China China /
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Others
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10

Product name Oxide ceramic sputtering targets Certification -
Category Industrial Supplies
Other Machinery & Industry Equipment
Oxide
Ingredients -
Keyword chemical , sputtering targets , thin film coating , evaporation material Unit Size -
Brand name TYR Unit Weigh -
origin Stock -
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Product Information

TYR has been established in 2004 year, specializes in a wide category of sputtering targets, evaporation source material, rare earth material and chemistry reagent, PVD materials base on metals, alloys, compounds.

we offer targets bonding service, we serving government research establishments, universities and high technology industries.

We using a variety of specialized processes including hot pressing, hot/cold isostatic pressing, and vacuum melting, vacuum sintering, we can provide the kind of homogenous, fine-grained, high-density materials that conform to the strictest quality control, we always aim to put quality first

Oxide Sputtering Targets

Metal Sputtering Targets     Alloy Sputtering Targets    Noble Metal and alloy Sputtering Targets

Ceramic Sputtering Targets (Oxide, Nitride, Sulfide, Carbide, Boride, Antimonide, Fluoride, Selenide, Silicide, Telluride, Arsenide)

Shape: discs, plate, rod, tube, sheet, Delta, and per drawing 

Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

Spec.: Diameter: 355.6mm (14") max. Single piece Size: Length: <254mm, Width: <127mm, Thickness: >1mm, if larger size than this, we can do it as tiles joint by 45 degree or 90 degree.

Material Name

Purity (Composition)

 Al2O3

 99.8%, 99.99%

Al2O3-ZnO (AZO)

99.99%, 2-98wt% 

 Sb2O3

 99.9%

Sb2O3-SnO2 (ATO)

99.99%, 90/10wt%, made per requested

 Cr2O3

 99.9%

 CuO, Cu2O

 99.9%

 CeO2

 CeO2/TREO>99.99%, TREO: 99%

 Dy2O3

 Dy2O3/TREO>99.5%, 99.9%, TREO: 99%

 Eu2O3

 Eu2O3/TREO>99.99%, TREO: 99%

 Er2O3

 Er2O3/TREO>99.9%,  TREO: 99%

 GeO2

 99.9%

 Gd2O3

 Gd2O3/TREO: 99.99% TREO: 99%

 Ho2O3

 Ho2O3/TREO>99.9%, TREO: 99%

 HfO2

 99.5%

HfO2-Y2O3

99.99%, 85/15wt%, made per requested

 Fe3O4, FeO, Fe2O3

 99.9%

 In2O3

 99.9%

In2O3-ZnO

99.99%, 90/10wt%, made per requested

 La2O3

 La2O3/TREO:99.99%, TREO: 99%

 Lu2O3

 Lu2O3/TREO>99.99% TREO: 99%

 MgO

 99.99%

MoO3

99.5%

 NiO

 99.9%

 Nb2Ox, Nb2O5

 99.99%

 Nd2O3

 Nd2O3/TREO>99.5%, 99.995%, TREO: 99%

 Pr6O11

 Pr6O11/TREO>99.5%, 99.99%, TREO: 99%

 Sm2O3

 Sm2O3/TREO>99.99%, TREO: 99%

 SiO, SiO2

 99.99%

 Sc2O3

 Sc2O3/TREO>99.99%, 99.999%, TREO: 99%

 Tb4O7

 Tb4O7/TREO>99.95%,  99.99% TREO: 99%

 Ta2O5

 99.99%

Ta2O5-Er2O3

99.9%, 95/5wt%, made per requested

 TiO, TiO2, Ti3O5, Ti2O3

 99.5%

 Tm2O3

 Tm2O3/TREO> 99.99% TREO: 99%

 SnO2, SnO

 99.9%

In2O3-SnO2

99.99%, 90/10wt%, 95/5wt%, made per requested

WO3

99%

WO3-Al

99.9%, 90/10wt%, made per requested

WO3-Li

99.9%,97/3wt%, made per requested

 Yb2O3

 Yb2O3/TREO>99.99% TREO: 99%

 Y2O3

 Y2O3/TREO>99.99% TREO: 99%

ZrO2-Y2O3 (YSZ)

99.95%, 85/15wt%, made per requested

 ZrO2

 99.5%

 ZnO

 99.99%

Ga2O3-ZnO (GZO)

99.99%, 90/10wt%, made per requested

In2O3-Ga2O3-ZnO (IZGO)

99.99%, 95/5/5at%, made per requested

    We have only listed the more popular material. Please feel free contact us with any special requirements at any times, we will try to get back for you ASAP.

Sputtering Process Applications : Magnetic Data Storage,Electronics / Semiconductor,Displays,Glass 

Coatings,Photovoltaics,Solar Thermal,Wear Resistance

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Huizhou Tian Yi Rare Material Co.,Ltd

Country / Year Established
China China /
Membership
BIZ
Business type
Others

10

President
Amy Chiu
Address
12 K of Shiji, Shijixingtian Bldg, YanDa Road, Huizhou, China
Product Category
Industrial Supplies,Other Minerals & Metallurgy Products,Semiconductors
No. of Total Employees
1-50
Company introduction
TYR has been established in 2004 year, specializes in a wide category of sputtering targets, evaporation source material, rare earth material and chemistry reagent, PVD materials base on metals, alloys, compounds. we offer targets bonding service, we serving government research establishments, universities and high technology industries. We using a variety of specialized processes including hot pressing, hot/cold isostatic pressing, and vacuum melting, vacuum sintering, we can provide the kind of homogenous, fine-grained, high-density materials that conform to the strictest quality control, we always aim to put quality first. Our product list include Metal sputtering targets, Alloy sputtering targets, Noble metal sputtering targets, Noble alloy sputtering targets, Oxide Ceramic Sputtering targets, Boride Ceramic Sputtering Targets, Carbide Ceramic Sputtering Targets, Fluoride Ceramic Sputtering Targets, Nitride Ceramic Sputtering Targets, Sulfide Ceramic Sputtering Targets, Selenide Ceramic Sputtering Targets, Silicide Ceramic Sputtering Targets, Telluride Ceramic Sputtering Targets, metal evaporation source, alloy evaporation source, optical thin film coating material, rare earth oxide and each high pure chemistry reagent. Sputtering Targets Materials list: High Pure Metal Sputtering Targets: Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper (Cu), Dysprosium (Dy), Erbium (Er), Eur (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, (C), Hafnium (Hf), Holmium (Ho), Iridium (Ir), Indium (In), Iron (Fe), Lanthanum (La), Lead (Pb), Lutetium (Lu), Manganese (Mn), Molybdenum (Mo), Magnesium (Mg), Neodymium (Nd), Niobium (Nb), Nickel (Ni), Palladium (Pd), Platinum (Pt), Praseodymium (Pr), Rhenium (Re), Ruthenium (Ru), Samarium (Sm), Scandium (Sc), Selenium (Se), Silicon (Si), Silver (Ag), Tantalum (Ta), Terbium (Tb), Tellurium (Te),Tin (Sn), Thulium (Tm), Titanium (Ti), Tungsten (W), Vanadium (V), Ytterbium (Yb), Yttrium (Y), Zirconium (Zr), Zinc (Zn) ; Alloy Sputtering Targets: Al alloy targets, Al-Cu, Al-Cr, Al-Nd, Al-Si, Al-Si-Cu, Al-Ag Cu alloy targets: Cu-Ag, Cu-Co, Cu-Ga, Cu-In, Cu-Ni Co alloy targets: Co-Cr, Co-Cr-Mo, Co-Fe, Co-Fe-B ,Co-Ni, Co-Ni-Cr, Co-Pt Ni alloy targets: Ni-Al, Ni-Cr, Ni-Cr-Si, Ni-Fe, Ni-Mn, Ni-Ti, Ni-V, Ti alloy targets: Ti-Al, Ti-Ni, Ti-Zr, Ti-Co Ta alloy targets: Ta-Al, Ta-W W alloy targets: W-Ti, W-Mo, W-B, W-Re Mo alloy targets: Mo-Nb, Mo-Si, Mo-Al Fe alloy targets: Fe-B, Fe-Co, Fe-Mn, Fe-Hf, Fe-Gd, Fe-Tb Zr alloy targets: ZrAl, ZrCu, ZrFe, ZrNb, ZrNi, ZrTi, ZrY, Noble alloy targets: Au-Ag, Ag-Cu, Ir-Mn, Ir-Re, Ir-Ru, Au-Sn, Ag-In, Ag-Sn e.t.c Ceramic sputtering target: Oxide Ceramic Sputtering targets: Al2O3, AZO, Sb2O3, ATO, BaTiO3, Bi2O3, CeO2, CuO, Cr2O3, Dy2O3, Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2, HfO2, Ho2O3, In2O3, In2O3-SnO2 (ITO), Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3, LiNbO3, Lu2O3, MgO, MoO3, Nd2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2, Tm2O3, TiO, TiO2, Ti3O5, Ti2O3, SnO2, SnO, WO3, WO3-Li, V2O5, VO2, Yb2O3, Y2O3, Y2O3-ZrO2 (YSZ), YBCO, ZnO, ZnO:Al, ZnO-In2O3, ZrO2, ZrO2-5-15wt%CaO) Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, FeB, HfB2 ,LaB6, Mo2B, Mo2B5 ,NbB, TaB2, TiB2, W2B5, WB, VB, YB6, ZrB2 Carbide Ceramic Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, W2C, VC, ZrC Fluoride Ceramic Sputtering Targets : AlF3, BaF2, CaF2, LiF, MgF2, NaF, Na3AlF6, YF3, YbF3 Nitride Ceramic Sputtering Targets :AlN, BN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN Sulfide Ceramic Sputtering Targets: CuS, Cu2S, CdS, FeS, FeS2, GeS, SnS, In2S3, MoS2, TaS2, WS2, ZnS Selenide Ceramic Sputtering Targets: Bi2Se3, CdSe, CuSe, Ga2Se3, In2Se3, PbSe, MoSe2, NbSe2, TaSe2, WSe2, ZnSe Silicide Ceramic Sputtering Targets: Cr3Si, CrSi2, CoSi2, HfSi2, MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2, ZrSi2 Telluride Ceramic Sputtering Targets: Bi2Te3, CdTe, CuTe, Ga2Te3, GeTe, PbTe, MoTe2, NbTe2, TaTe2, WTe2, ZnTe
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