high pure Metal sputtering targets


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TYR
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Keyword
evaporation, sputtering targets, thin film coating, metal targets
Category
Industrial Supplies , Other Minerals & Metallurgy Products , Semiconductors

Huizhou Tian Yi Rare Material Co.,Ltd

Membership
BIZ
Country / Year Established
China China /
Business type
Others
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10

Product name high pure Metal sputtering targets Certification -
Category Industrial Supplies
Other Minerals & Metallurgy Products
Semiconductors
Ingredients -
Keyword evaporation , sputtering targets , thin film coating , metal targets Unit Size -
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Product Information

Metal Sputtering Targets

Metal Sputtering Targets     Alloy Sputtering Targets    Noble Metal and alloy Sputtering Targets

Ceramic Sputtering Targets (Oxide, Nitride, Sulfide, Carbide, Boride, Antimonide, Fluoride, Selenide, Silicide, Telluride, Arsenide)

Shape: discs, plate, rod, tube, sheet, Delta, and per drawing 

Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

Spec.: Diameter: 355.6mm (14") max. Single piece Size: Length: <254mm, Width: <127mm, Thickness: >1mm, if larger size than this, we can do it as tiles joint by 45 degree or 90 degree.

 

 

 Material Name

Formula

Purity

 

   Aluminum

 Al

 99.99%, 99.999%

Ask for a Quotation

  Antimony

 Sb

 99.99%, 99.999%

 

 Boron

 B

 99.9%,99.99%, 99.999%

 

   Barium

 Ba

 99.3%, 99.9%, 99.95%

 

    Bismuth

 Bi

 99.99%, 99.999%

 

  Beryllium

 Be

 99.99%

 

  Graphite

 C

 99.99%

 

  Cobalt

 Co

 99.9%, 99.95%, 99.99%

 

    Chromium

 Cr

 99.5%, 99.9%, 99.95%

 

    Copper

 Cu

 99.99%, 99.999%

 

    Cadmium

 Cd

 99.99%

 

    Cerium

 Ce

 Ce/TREM>99.5%, 99.9%, TREM: 99%

 

   Dysprosium

 Dy

 Dy/TREM>99.5%, 99.9%, TREM: 99%

 

    Europium

 Eu

 Eu/TREM>99.95, 99.99%, TREM: 99%

 

   Erbium

 Er

 Er/TREM>99.9%,  TREM: 99%

 

    Germanium

 Ge

 99.999%, polycrystal or monocrystal

 

    Gadolinium

 Gd

 Gd/TREM>99.9%, 99.99% TREM: 99%

 

    Holmium

 Ho

 Ho/TREM>99.9%, 99.99% TREM: 99%

 

    Hafnium

 Hf

 99.5%, 99.9%

 

    Iron

 Fe

 99.9%, 99.99%

 

    Iridium

 Ir

 99.95%

 

    Indium

 In

 99.9%, 99.99%,99.999%

 

    Lanthanum

 La

 La/TREM>99.5%, 99.9%, TREM: 99%

 

    Lutetium 

 Lu

 Lu/TREM>99.99% TREM: 99%

 

  Lithium

 Li

 99.5%

 

    Molybdenum

 Mo

 99.95%

 

    Magnesium

 Mg

 99.95%

 

   Nickel

 Ni

 99.9%, 99.98%, 99.995%, 99.999%

 

   Niobium

 Nb

 99.95%

 

    Neodymium

 Nd

 Nd/TREM>99.5%, 99.9%, TREM: 99%

 

    Lead

 Pb

 99.99%

 

    Praseodymium

 Pr

 Pr/TREM>99.5%, TREM: 99%

 

    Ruthenium

 Ru

 99.95%

 

    Rhenium

 Re

 99.95%, 99.99%

 

    Samarium

 Sm

 Sm/TREM>99.9%, TREM: 99%

 

  Silicon

 Si

 99.999%, 99.9999%,poly or mono crystal, doped or undoped 

 

    Selenium

 Se

 99.99%, 99.999%

 

    Scandium

 Sc

 Sc/TREM>99.9%, 99.99% TREM: 99%

 

    Silver

 Ag

 99.99%

 

    Terbium

 Tb

 Tb/TREM>99.9%, 99.99% TREM: 99%

 

   Tellurium

 Te

 99.99%,99.999%

 

    Tantalum

 Ta

 99.95%, 99.99%

 

   Titanium 

 Ti

 99.7%, 99.99%, 99.995%, 99.999%

 

    Thulium

 Tm

 Tm/TREM>99.9%, 99.99% TREM: 99%

 

   Tin

 Sn

 99.99%, 99.999%

 

    Tungsten

 W

 99.95%

 

    Vanadium

 V

 99.9%

 

   Ytterbium

 Yb

 Yb/TREM>99.9%, 99.99% TREM: 99%

 

 We have only listed the more popular material. Please feel free contact us with any special requirements at any times, we will try to get back for you ASAP.Sputtering Process Applications : Magnetic Data Storage,Electronics / Semiconductor,Displays,Glass, Coatings,Photovoltaics,Solar Thermal,Wear Resistance

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Huizhou Tian Yi Rare Material Co.,Ltd

Country / Year Established
China China /
Membership
BIZ
Business type
Others

10

President
Amy Chiu
Address
12 K of Shiji, Shijixingtian Bldg, YanDa Road, Huizhou, China
Product Category
Industrial Supplies,Other Minerals & Metallurgy Products,Semiconductors
No. of Total Employees
1-50
Company introduction
TYR has been established in 2004 year, specializes in a wide category of sputtering targets, evaporation source material, rare earth material and chemistry reagent, PVD materials base on metals, alloys, compounds. we offer targets bonding service, we serving government research establishments, universities and high technology industries. We using a variety of specialized processes including hot pressing, hot/cold isostatic pressing, and vacuum melting, vacuum sintering, we can provide the kind of homogenous, fine-grained, high-density materials that conform to the strictest quality control, we always aim to put quality first. Our product list include Metal sputtering targets, Alloy sputtering targets, Noble metal sputtering targets, Noble alloy sputtering targets, Oxide Ceramic Sputtering targets, Boride Ceramic Sputtering Targets, Carbide Ceramic Sputtering Targets, Fluoride Ceramic Sputtering Targets, Nitride Ceramic Sputtering Targets, Sulfide Ceramic Sputtering Targets, Selenide Ceramic Sputtering Targets, Silicide Ceramic Sputtering Targets, Telluride Ceramic Sputtering Targets, metal evaporation source, alloy evaporation source, optical thin film coating material, rare earth oxide and each high pure chemistry reagent. Sputtering Targets Materials list: High Pure Metal Sputtering Targets: Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper (Cu), Dysprosium (Dy), Erbium (Er), Eur (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, (C), Hafnium (Hf), Holmium (Ho), Iridium (Ir), Indium (In), Iron (Fe), Lanthanum (La), Lead (Pb), Lutetium (Lu), Manganese (Mn), Molybdenum (Mo), Magnesium (Mg), Neodymium (Nd), Niobium (Nb), Nickel (Ni), Palladium (Pd), Platinum (Pt), Praseodymium (Pr), Rhenium (Re), Ruthenium (Ru), Samarium (Sm), Scandium (Sc), Selenium (Se), Silicon (Si), Silver (Ag), Tantalum (Ta), Terbium (Tb), Tellurium (Te),Tin (Sn), Thulium (Tm), Titanium (Ti), Tungsten (W), Vanadium (V), Ytterbium (Yb), Yttrium (Y), Zirconium (Zr), Zinc (Zn) ; Alloy Sputtering Targets: Al alloy targets, Al-Cu, Al-Cr, Al-Nd, Al-Si, Al-Si-Cu, Al-Ag Cu alloy targets: Cu-Ag, Cu-Co, Cu-Ga, Cu-In, Cu-Ni Co alloy targets: Co-Cr, Co-Cr-Mo, Co-Fe, Co-Fe-B ,Co-Ni, Co-Ni-Cr, Co-Pt Ni alloy targets: Ni-Al, Ni-Cr, Ni-Cr-Si, Ni-Fe, Ni-Mn, Ni-Ti, Ni-V, Ti alloy targets: Ti-Al, Ti-Ni, Ti-Zr, Ti-Co Ta alloy targets: Ta-Al, Ta-W W alloy targets: W-Ti, W-Mo, W-B, W-Re Mo alloy targets: Mo-Nb, Mo-Si, Mo-Al Fe alloy targets: Fe-B, Fe-Co, Fe-Mn, Fe-Hf, Fe-Gd, Fe-Tb Zr alloy targets: ZrAl, ZrCu, ZrFe, ZrNb, ZrNi, ZrTi, ZrY, Noble alloy targets: Au-Ag, Ag-Cu, Ir-Mn, Ir-Re, Ir-Ru, Au-Sn, Ag-In, Ag-Sn e.t.c Ceramic sputtering target: Oxide Ceramic Sputtering targets: Al2O3, AZO, Sb2O3, ATO, BaTiO3, Bi2O3, CeO2, CuO, Cr2O3, Dy2O3, Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2, HfO2, Ho2O3, In2O3, In2O3-SnO2 (ITO), Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3, LiNbO3, Lu2O3, MgO, MoO3, Nd2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2, Tm2O3, TiO, TiO2, Ti3O5, Ti2O3, SnO2, SnO, WO3, WO3-Li, V2O5, VO2, Yb2O3, Y2O3, Y2O3-ZrO2 (YSZ), YBCO, ZnO, ZnO:Al, ZnO-In2O3, ZrO2, ZrO2-5-15wt%CaO) Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, FeB, HfB2 ,LaB6, Mo2B, Mo2B5 ,NbB, TaB2, TiB2, W2B5, WB, VB, YB6, ZrB2 Carbide Ceramic Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, W2C, VC, ZrC Fluoride Ceramic Sputtering Targets : AlF3, BaF2, CaF2, LiF, MgF2, NaF, Na3AlF6, YF3, YbF3 Nitride Ceramic Sputtering Targets :AlN, BN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN Sulfide Ceramic Sputtering Targets: CuS, Cu2S, CdS, FeS, FeS2, GeS, SnS, In2S3, MoS2, TaS2, WS2, ZnS Selenide Ceramic Sputtering Targets: Bi2Se3, CdSe, CuSe, Ga2Se3, In2Se3, PbSe, MoSe2, NbSe2, TaSe2, WSe2, ZnSe Silicide Ceramic Sputtering Targets: Cr3Si, CrSi2, CoSi2, HfSi2, MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2, ZrSi2 Telluride Ceramic Sputtering Targets: Bi2Te3, CdTe, CuTe, Ga2Te3, GeTe, PbTe, MoTe2, NbTe2, TaTe2, WTe2, ZnTe
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France, Metropolitan France, Metropolitan

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Hong Kong(China) Hong Kong(China)

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South Korea South Korea

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