CLO: Chemical Lift-off
LED Chips separation from sapphire using CLO Technology

CLO Process

Selectively etching of CrN buffer

CLO: Chemical Lift-Off

• Low cost
• No machine
• High Yield
• High Throughput

Epitaxy Technology
GaN on CrN buffer


High crystallinity with mirror-like surface

Comparison-CLO vs. LLO

• CLO: Chemical Lift-Off
• LLO: Laser Litf-Off

CLO-Wavesquaure New Tech.

• No dammage& No cracks
  -Clean & Smooth surface
• Batch type process
• Low cost process
• High Yield

LLO-Common Tech

• Cracks due to shock wave of laser
• One Wafer Process
• High cost process
• Low Yield

	WS CLO System	LLO System
Picture
System	Self-made	Commercialized
Price	1,000US$	>1MillionUS$
Throughput	Batch-process (Few hundred wafers/bach)	1-wafer process
Maintenance cost	No need	High
Technology	WS original technology	Company-dependent